Institution: The Hong Kong University of Science and Technology, China

Top Collaborators: Williams ID, Yi XY, Sung HH, Wang GC, Zhang QF, Ng HY, Wong WY, Cheung WM, Dai FR, Chiu WH, Han YG, Huang EK, Xu C, Zhu J, Duan T, Wu FH, Lam TC, Ip HF

Research Interests: Treatment, Ruthenium, Cerium, Water, PH, X-ray, Ethane, Ligands, Sulfur, Temperature, Acetone, Crystallography, Nitric Acid, Solvents, X-ray Crystallography, Distances, Bismuth, Oxygen, 2,2-bipyridyl, Bipyridyl
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