Institution: The Hong Kong University of Science and Technology, China

Top Collaborators: Williams ID, Yi XY, Sung HH, Wang GC, Ng HY, Wong WY, Cheung WM, Zhang QF, Ip HF, Dai FR, Chiu WH, Han YG, Huang EK, Xu C, Zhu J, Duan T, Wu FH, Lam TC

Research Interests: Treatment, Ruthenium, Cerium, Water, PH, X-ray, Ethane, Ligands, Sulfur, Temperature, Acetone, Crystallography, Nitric Acid, Solvents, X-ray Crystallography, Distances, Bismuth, Oxygen, 2,2-bipyridyl, Bipyridyl