Lee,Ho Nyung

Institution: Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA

Top Collaborators: Choi WS, Chisholm MF, Jeen H, Fera LA, Luo Z, Han MG, Shen YC, Zhou H, Zhu Y, Wang CY, Fister TT, Kalinin SV, Tsai HY, Eastman JA, Dagotto E, Fuoss PH, Egami T, Luo W, Fong DD, Park JC

Research Interests: Oxygen, Film, Electron, Work, Treatment, Charge, Bismuth, Lanthanum, Algorithm, Power, Technology, Temperature, Gallium, Indium, Adults, Death, Risk, Endophthalmitis, Injection, Keratitis