Law,Kock-Yee

Institution: Xerox Corporation, Xerox Research Center, Webster 800 Phillips Road, 147-59B Webster, New York 14580, USA

Research Interests: Water, Silicon, Ink, Work, Air, Microscopy, Polyethylene, Report, Separated, Sits, Surface Property, Film, Paper, Polyester, Printing, Ptfe, Fluorination, Hand, Pressure, Surface Tension