Ehrlich,Steven N

Institution: Pontificia Universidad Católica de Chile, Chile

Top Collaborators: Vergara I, Corrales T, Soza P, Volkmann UG, Bai M, Wang SK, Hansen FY, Mo H, Del Campo V, Cisternas E, Taub H

Research Interests: Air, Alkanes, Atmospheric Pressure, Axis, Dotriacontane, Film, Films, Growth, Melting, Motivation, Pressure, Synchrotron, Temperature, Vacuum, X-ray