Doyle,Fiona M

Institution: Dow Advanced Materials, The Dow Chemical Company, 451 Bellevue Road, Newark, Delaware 19713, USA

Top Collaborators: Liu Z, Pham AL, Sedlak DL

Research Interests: PH, Solutions, Iron, Silica, Water, Adsorption, Air, Efficiency, Ions, Separation, Surface Tension, Active Sites, Behavior, Treatment