Institution: National Institute of Advanced Industrial Science and Technology (AIST), Japan

Top Collaborators: Endo A, Yamaura T, Yamashita K, Matsuoka F, Hihara E, Hwang J

Research Interests: Silica, Water, Adsorption, Capillary, Interfacial Tension, Pressure, Radius, Temperature, Water Vapor, At 10, Behavior, Charge, Concentrations, Films, Ion Transport, Proton, Solutions
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